- Unique and patented UPAC (Upper Platen Adaptive Control) System
- Unique LPAC (Lower Platen Adaptive Control) System (patent pending)
- Monitoring of the cooling lubricant flow rate
- Loop control
- First-Class customer support for the highest machine availability and productivity
- Integrated high precision interferometric device for in-situ measurement of the wafer thickness
- High-Pressure Conditioner
- Slurry Recycling Station
- Slurry Pressure Distribution
- Integrated Process Data Recording (DataCare®)
- Industry 4.0
- Touch Screen
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